설명
Mask aligner Suss MJB 3 HP 350 W High pressure system환경 설정
Accuracy (resolution): 0.5 µm 350W Lamphouse incl. UV 300/400 Exposure Optics Lamp Power Supply CIC 500 Exposure Timer Single field Microscope with Turret of 3 Objectives Binocular Tube with 2 Oculars X,Y, Theta Alignment Stage Fine adjustment with Micrometer Screws Chuck up to 3“ Wafer and Maskholder for up to 4“ Mask Pneumatic BoxOEM 모델 설명
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."문서
문서 없음
카테고리
Mask/Bond Aligners
마지막 검증일: 19일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
145110
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
SUSS MicroTec / KARL SUSS
MJB3
카테고리
Mask/Bond Aligners
마지막 검증일: 19일 전
주요 품목 세부 정보
조건:
Refurbished
작동 상태:
알 수 없음
제품 ID:
145110
웨이퍼 사이즈:
알 수 없음
빈티지:
알 수 없음
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Mask aligner Suss MJB 3 HP 350 W High pressure system환경 설정
Accuracy (resolution): 0.5 µm 350W Lamphouse incl. UV 300/400 Exposure Optics Lamp Power Supply CIC 500 Exposure Timer Single field Microscope with Turret of 3 Objectives Binocular Tube with 2 Oculars X,Y, Theta Alignment Stage Fine adjustment with Micrometer Screws Chuck up to 3“ Wafer and Maskholder for up to 4“ Mask Pneumatic BoxOEM 모델 설명
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."문서
문서 없음