설명
Single Block (Resist Coater/Developer)환경 설정
Tool is operating in clean room. Labelled as LEASE. Buyer will be responsible for arranging disassembly and rigging for tool. BLOCK DIAGRAM: Please see. Additional configurations will be provided. Pictures will be collected. Missing or damaged parts: Not reported. Please inspect to confirm.OEM 모델 설명
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.문서
문서 없음
TEL / TOKYO ELECTRON
ACT 12
검증됨
카테고리
Coaters & Developers
마지막 검증일: 20일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
21309
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
유사 등재물
모두 보기
TEL / TOKYO ELECTRON
ACT 12
카테고리
Coaters & Developers
마지막 검증일: 20일 전
주요 품목 세부 정보
조건:
Used
작동 상태:
알 수 없음
제품 ID:
21309
웨이퍼 사이즈:
12"/300mm
빈티지:
알 수 없음
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
설명
Single Block (Resist Coater/Developer)환경 설정
Tool is operating in clean room. Labelled as LEASE. Buyer will be responsible for arranging disassembly and rigging for tool. BLOCK DIAGRAM: Please see. Additional configurations will be provided. Pictures will be collected. Missing or damaged parts: Not reported. Please inspect to confirm.OEM 모델 설명
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.문서
문서 없음